翻訳と辞書 |
Front end of line : ウィキペディア英語版 | Front end of line
The front-end-of-line (FEOL) is the first portion of IC fabrication where the individual devices (transistors, capacitors, resistors, etc.) are patterned in the semiconductor.〔 〕 FEOL generally covers everything up to (but not including) the deposition of metal interconnect layers. FEOL contains all processes of CMOS fabrication needed to form fully isolated CMOS elements: # Selecting the type of wafer to be used; Chemical-mechanical planarization and cleaning of the wafer. # Shallow trench isolation (STI) (or LOCOS in early processes, with feature size > 0.25 μm) # Well formation # Gate module formation # Source and drain module formation ==References==
抄文引用元・出典: フリー百科事典『 ウィキペディア(Wikipedia)』 ■ウィキペディアで「Front end of line」の詳細全文を読む
スポンサード リンク
翻訳と辞書 : 翻訳のためのインターネットリソース |
Copyright(C) kotoba.ne.jp 1997-2016. All Rights Reserved.
|
|